Amorphous thin film growth: theory compared with experiment
arXiv:cond-mat/9912249 · doi:10.1209/epl/i2000-00235-7
Abstract
Experimental results on amorphous ZrAlCu thin film growth and the dynamics of the surface morphology as predicted from a minimal nonlinear stochastic deposition equation are analysed and compared. Key points of this study are (i) an estimation procedure for coefficients entering into the growth equation and (ii) a detailed analysis and interpretation of the time evolution of the correlation length and the surface roughness. The results corroborate the usefulness of the deposition equation as a tool for studying amorphous growth processes.
7 pages including 5 figures