Magnetoresistance and spin polarization in the insulating regime of a Si two-dimensional electron system
arXiv:cond-mat/0507136 · doi:10.1103/PhysRevB.72.075344
Abstract
We have studied the magnetoresistance in a high-mobility Si inversion layer down to low electron concentrations at which the longitudinal resistivity $Ï_{xx}$ has an activated temperature dependence. The angle of the magnetic field was controlled so as to study the orbital effect proportional to the perpendicular component $B_\perp$ for various total strengths $B_{\rm tot}$. A dip in $Ï_{xx}$, which corresponds to the Landau level filling factor of $ν=4$, survives even for high resistivity of $Ï_{xx} \sim 10^8 Ω$ at $T= 150 {\rm mK}$. The linear $B_{\rm tot}$-dependence of the value of $B_\perp$ at the dip for low $B_{\rm tot}$ indicates that a ferromagnetic instability does not occur even in the far insulating regime.
6 pages, 7 figures, submitted to PRB