Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters
arXiv:cond-mat/0501374 · doi:10.1088/0022-3727/38/14/017
Abstract
The micro-properties (structure and composition), and macro-properties (electrical and optical properties) of zinc oxide (ZnO) thin films deposited on glass substrates using a filtere vacuum arc deposition (FVAD) system were investigated as a function of oxygen pressure (0.37 - 0.5 Pa) and arc current (100 - 300 A). Correlations between the various properties were investigated.