Systematic efficiency study of line-doubled zone plates
arXiv:1705.02807 · doi:10.1016/j.mee.2017.01.017
Abstract
Line-doubled Fresnel zone plates provide nanoscale, high aspect ratio structures required for efficient high resolution imaging in the multi-keV x-ray range. For the fabrication of such optics a high aspect ratio HSQ resist template is produced by electron-beam lithography and then covered with Ir by atomic layer deposition (ALD).