Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

Abstract

We investigate the fabrication of electrical contacts using ion- and electron-beam induced deposition of platinum at the sub-μm scale. Halos associated with the metal surface decoration are characterized electrically in the 0.05-2 μm range using transport measurements, conducting atomic force microscopy and Kelvin probe microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-μm scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-μm scale. Four-point transport measurements using μm-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube.